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Advanced applications in microphotonics using proton beam writing

✍ Scribed by A.A. Bettiol; S.Y. Chiam; E.J. Teo; C. Udalagama; S.F. Chan; S.K. Hoi; J.A. van Kan; M.B.H. Breese; F. Watt

Publisher: Elsevier Science
Year: 2009
Tongue: English
Weight: 736 KB
Volume: 267
Category: Article
ISSN: 0168-583X
DOI: 10.1016/j.nimb.2009.03.035

No coin nor oath required. For personal study only.

✦ Synopsis

Proton beam writing (PBW) is a powerful tool for prototyping microphotonic structures in a wide variety of materials including polymers, insulators, semiconductors and metals. Prototyping is achieved either through direct fabrication with the proton beam, or by the fabrication of a master that can be used for replication. In recent times we have explored the use of PBW for various advanced optical applications including fabrication of subwavelength metallic structures and metamaterials, direct write of silicon waveguides for mid IR applications and integrated waveguides for lab-on-a-chip devices. This paper will review the recent progress made in these areas with particular emphasis on the main advantages of using the PBW technique for these novel applications.

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