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Adsorption Reactions of Dimethylaluminum Isopropoxide and Water on the H/Si(100)-2 × 1 Surface: Initial Reactions for Atomic Layer Deposition of Al 2 O 3

✍ Scribed by Ghosh, Manik Kumer; Choi, Cheol Ho


Book ID
126844242
Publisher
American Chemical Society
Year
2006
Tongue
English
Weight
889 KB
Volume
110
Category
Article
ISSN
0022-3654

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Atomic layer deposition of Al2O3 and SiO
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Al O and SiO were deposited on BN particles with atomic layer control using alternating exposures of Al CH rH O 2 3 2 3 3 2 and SiCl rH O, respectively. The sequential surface chemistry was monitored in vacuum using transmission Fourier 4 2 Ž . transform infrared FTIR spectroscopy studies on high su