A systematic characterization of AZPN114 electron beam resist
โ Scribed by S.E. Huq; R.A. Moody; P. Herman; P.D. Prewett
- Publisher
- Elsevier Science
- Year
- 1994
- Tongue
- English
- Weight
- 369 KB
- Volume
- 23
- Category
- Article
- ISSN
- 0167-9317
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Process conditions have been investigated for electron beam lithography in the resolution regime of 150urn and below, using chemically amplified resist AZPNll4. Response surface method was used to reveal the influence and interrelationship between different thermal process parameters, based on 27 ex
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