Optimized process for electron beam nano
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Z. Cui; R.A. Moody; I.M. Loader; J.G. Watson; P.D. Prewett
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Article
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1997
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Elsevier Science
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English
โ 276 KB
Process conditions have been investigated for electron beam lithography in the resolution regime of 150urn and below, using chemically amplified resist AZPNll4. Response surface method was used to reveal the influence and interrelationship between different thermal process parameters, based on 27 ex