A study of low energy high dose nitrogen ion implantation in iron – Effect of ion energy and current density
✍ Scribed by H.K. Sanghera; J.L. Sullivan
- Book ID
- 114170892
- Publisher
- Elsevier Science
- Year
- 1999
- Tongue
- English
- Weight
- 520 KB
- Volume
- 152
- Category
- Article
- ISSN
- 0168-583X
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To advance the understanding of fundamental physical and chemical processes occurring in ion bombardment of metals, ion beam nitridation of aluminium, iron, copper and gold is studied in the energy range 2-5 keV, at current densities of 1 and 5 lA cm-2, for each ion energy. The concentration proÐles
Ion implantation is of great importance in semiconductor device fabrication. Owing to the increasing interest of" the microelectronic industry in the implantation of ions in the megaelectronvolt energy range, high energy beams are required. Furthermore, for several applications the implanted dose is