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A study of electromigration in aluminum and aluminum-silicon thin film resistors using noise technique

✍ Scribed by A. Diligenti; P.E. Bagnoli; B. Neri; S. Bea; L. Mantellassi

Publisher: Elsevier Science
Year: 1989
Tongue: English
Weight: 597 KB
Volume: 32
Category: Article
ISSN: 0038-1101
DOI: 10.1016/0038-1101(89)90042-7

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