A study of electromigration in aluminum and aluminum-silicon thin film resistors using noise technique : D. Diligenti, P. E. Bagnoli, B. Neri, S. Bea and L. Mantellassi. Solid-St. Elect. 32(1), 11 (1989)

• Publisher: Elsevier Science
• Year: 1990
• Tongue: English
• Weight: 129 KB
• Volume: 30
• Category: Article
• ISSN: 0026-2714
• DOI: 10.1016/0026-2714(90)90131-6