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Reliability study on polycrystalline silicon thin film resistors used in LSIs under thermal and electrical stress : Hiroko Akimori, Nobuo Owada, Tadayuki Taneoka and Hizura UDA. 28th A. Proc. Reliab. Phys. Symp. (IEEE), 276 (March 1990)


Publisher
Elsevier Science
Year
1991
Tongue
English
Weight
118 KB
Volume
31
Category
Article
ISSN
0026-2714

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