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A saddle field ion source of spherical configuration for etching and thinning applications

✍ Scribed by J. Franks; A.M. Ghander

Publisher
Elsevier Science
Year
1974
Tongue
English
Weight
355 KB
Volume
24
Category
Article
ISSN
0042-207X

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## Abstract Highly charged ions significantly differ in their physical properties compared to β€œclassical” low charged ions. With the Dresden EBIT/EBIS family (EBIT: Electron Beam Ion Trap, EBIS: Electron Beam Ion Source) a compact, economic and long‐term stable source setup for highly charged ions