Sources of highly charged ions as a platform technology for applications in nanotechnology and medicine
✍ Scribed by G. Zschornack; F. Grossmann; V.P. Ovsyannikov; R. Heller; U. Kentsch; M. Kreller; M. Schmidt; A. Schwan; A. Silze; F. Ullmann
- Publisher
- John Wiley and Sons
- Year
- 2009
- Tongue
- English
- Weight
- 160 KB
- Volume
- 40
- Category
- Article
- ISSN
- 0933-5137
No coin nor oath required. For personal study only.
✦ Synopsis
Abstract
Highly charged ions significantly differ in their physical properties compared to “classical” low charged ions. With the Dresden EBIT/EBIS family (EBIT: Electron Beam Ion Trap, EBIS: Electron Beam Ion Source) a compact, economic and long‐term stable source setup for highly charged ions is available providing the platform technology for various applications. Beside the use in basic as well as in applied research this technology is also suitable for nanotechnology and medical applications. Potential applications and first proof‐of‐principle experiments are discussed. The integration of an EBIT in a FIB setup is exemplified.