✦ LIBER ✦
Reactive ion beam etching of tantalum silicide for VLSI applications : A. Baudrant, A. Passerat and D. Bollinger. Solid St. Technol. 183 (September 1983)
- Publisher
- Elsevier Science
- Year
- 1984
- Tongue
- English
- Weight
- 130 KB
- Volume
- 24
- Category
- Article
- ISSN
- 0026-2714
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