Bi-layer resist processes for deep-UV and oxygen plasma are studied. Poly(dimethyl-co-diphenylsilane) is used as both deep-UV and oxygen plasma portable conformable masks because of its strong deep-UV and i-line (365 nm) absorption and its resistance to oxygen plasma. The bottom layer is P(MMA-PhPK)
β¦ LIBER β¦
A molded deep-UV portable conformable masking system
β Scribed by B. J. Lin; V. W. Chao; K. E. Petrillo; B. J. L. Yang
- Publisher
- Society for Plastic Engineers
- Year
- 1986
- Tongue
- English
- Weight
- 553 KB
- Volume
- 26
- Category
- Article
- ISSN
- 0032-3888
No coin nor oath required. For personal study only.
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