✦ LIBER ✦
Deep-UV lithography mask fabrication with 200nm feature size using a liftoff technique
✍ Scribed by A. Gruhle; F. Lalanne; J.P. Panabiere
- Publisher
- Elsevier Science
- Year
- 1991
- Tongue
- English
- Weight
- 464 KB
- Volume
- 13
- Category
- Article
- ISSN
- 0167-9317
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