Poly(dimethyl-co-diphenylsilane) as a deep-UV and an oxygen plasma portable conformable mask
✍ Scribed by Wen-an Loong; Tsung-hsiung Wang
- Publisher
- Elsevier Science
- Year
- 1992
- Tongue
- English
- Weight
- 564 KB
- Volume
- 18
- Category
- Article
- ISSN
- 0167-9317
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✦ Synopsis
Bi-layer resist processes for deep-UV and oxygen plasma are studied. Poly(dimethyl-co-diphenylsilane) is used as both deep-UV and oxygen plasma portable conformable masks because of its strong deep-UV and i-line (365 nm) absorption and its resistance to oxygen plasma. The bottom layer is P(MMA-PhPK), a copolymer of methylmethacrylate and 30 wt% of phenylpropenylketone, for the positive-tone pattern. P(MMA-PhPK) has greater deep-UV exposure sensitivity compared to PMMA. Good vertical sidewall profiles of lines of bottom layers are obtained.
Keywords. Poly(dimethyl-co-diphenylsilane), poly(methylmethacrylate-co-phenylpropenylketone), portable conformable mask, bi-layer resist.