✦ LIBER ✦

Liquid phase silylation of a bilayer resist system using blended deep-UV resists

✍ Scribed by John Hargreaves

Publisher: Elsevier Science
Year: 1999
Tongue: English
Weight: 688 KB
Volume: 45
Category: Article
ISSN: 0167-9317
DOI: 10.1016/s0167-9317(98)00286-x

No coin nor oath required. For personal study only.

✦ Synopsis

0.275 mm packed and 0.20 mm isolated features have been printed with a positive acting top-surface imaging process. The process consists of a bilayer resist scheme, the top layer of which is a chemically amplified negative resist whose resin is a blend of both novolak and poly(vinyl phenol). The latter, after exposure and post-exposure bake, is silylated in the liquid phase and the latent positive images are resolved using an oxygen plasma etch.

📜 SIMILAR VOLUMES

Liquid phase silylation of a bilayer res

Liquid phase silylation of a bilayer resist system

✍ John Hargreaves 📂 Article 📅 1999 🏛 Elsevier Science 🌐 English ⚖ 616 KB

0.35 mm packed and 0.20 mm isolated features have been printed with a positive acting top-surface imaging process. The process consists of a bilayer resist scheme, the top layer of which is a chemically amplified negative resist. The latter, after exposure and post-exposure bake, is silylated in the