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Liquid phase silylation of a bilayer resist system

โœ Scribed by John Hargreaves

Publisher
Elsevier Science
Year
1999
Tongue
English
Weight
616 KB
Volume
45
Category
Article
ISSN
0167-9317

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โœฆ Synopsis

0.35 mm packed and 0.20 mm isolated features have been printed with a positive acting top-surface imaging process. The process consists of a bilayer resist scheme, the top layer of which is a chemically amplified negative resist. The latter, after exposure and post-exposure bake, is silylated in the liquid phase and the latent positive images are resolved using an oxygen plasma etch.

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โœ John Hargreaves ๐Ÿ“‚ Article ๐Ÿ“… 1999 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 688 KB

0.275 mm packed and 0.20 mm isolated features have been printed with a positive acting top-surface imaging process. The process consists of a bilayer resist scheme, the top layer of which is a chemically amplified negative resist whose resin is a blend of both novolak and poly(vinyl phenol). The lat