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A hot hole-induced low-level leakage current in thin silicon dioxide films

✍ Scribed by Matsukawa, N.; Yamada, S.; Amemiya, K.; Hazama, H.

Book ID: 114536615
Publisher: IEEE
Year: 1996
Tongue: English
Weight: 579 KB
Volume: 43
Category: Article
ISSN: 0018-9383
DOI: 10.1109/16.543028

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