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A high-density MIM capacitor (13 fF/μm/sup 2/) using ALD HfO2 dielectrics

✍ Scribed by Xiongfei Yu, ; Chunxiang Zhu, ; Hang Hu, ; Chin, A.; Li, M.F.; Byung Jin Cho, ; Dim-Lee Kwong, ; Foo, P.D.; Ming Bin Yu,

No coin nor oath required. For personal study only.

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