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A detailed physical model for ion implant induced damage in silicon

โœ Scribed by Tian, S.; Morris, M.F.; Morris, S.J.; Obradovic, B.; Geng Wang; Tasch, A.F.; Snell, C.M.


Book ID
114537289
Publisher
IEEE
Year
1998
Tongue
English
Weight
302 KB
Volume
45
Category
Article
ISSN
0018-9383

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