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Non-destructive depth profiling of silicon ion implantation induced damage in silicon (100) substrates

โœ Scribed by S. Lynch; M. Murtagh; G.M. Crean; P.V. Kelly; M. O'Connor; C. Jeynes


Publisher
Elsevier Science
Year
1993
Tongue
English
Weight
346 KB
Volume
233
Category
Article
ISSN
0040-6090

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