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A comprehensive study on p+ polysilicon-gate MOSFET's instability with fluorine incorporation

โœ Scribed by Sung, J.J.; Lu, C.-Y.


Book ID
114536973
Publisher
IEEE
Year
1990
Tongue
English
Weight
963 KB
Volume
37
Category
Article
ISSN
0018-9383

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A study on fluorine incorporation in Ge
โœ C.X. Li; C.D. Wang; C.H. Leung; P.T. Lai; J.P. Xu ๐Ÿ“‚ Article ๐Ÿ“… 2009 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 374 KB

In this work, Ge p-MOS capacitors with HfTiON dielectric were fabricated. Fluorine was incorporated by post-deposition plasma annealing or pre-deposition plasma treatment. Experimental results showed that fluorine could result in lower interface-state density, smaller frequency dispersion and better