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3919. AES and XPS of silicon nitride films of varying refractive indices. (USA)


Book ID
104265015
Publisher
Elsevier Science
Year
1979
Tongue
English
Weight
107 KB
Volume
29
Category
Article
ISSN
0042-207X

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XPS and x-ray-induced AES have been used to study the reaction layers formed on silicon powder samples heated in ultra-high purity nitrogen at temperatures between 1100 and 1200 "C. An equation was derived to calculate the average surface reaction layer thicknesses from the silicon AES spectra. The