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2479. dc magnetron system for cathode sputtering

Publisher
Elsevier Science
Year
1977
Tongue
English
Weight
141 KB
Volume
27
Category
Article
ISSN
0042-207X

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✦ Synopsis

at 600Β°C in 11.2 ~ Ag/Cu bimetallic thin films prepared by vapour deposition on mica. The technique consists in matching experimental intensity bands to those calculated from assumed concentration profiles. The profiles which gave best fit in the Ag-rich layer were analysed by means of a linear diffusion equation solved in a finite region with fixed interface. The value of 1.45 Γ— I0-t2 cm2/sec was obtained for the interdiffusion coefficient in the Ag-rich phase.

πŸ“œ SIMILAR VOLUMES

dc magnetron system for cathode sputteri
dc magnetron system for cathode sputtering
✍ KI Kirov; NA Ivanov; ED Atanasova; GM Minchev πŸ“‚ Article πŸ“… 1976 πŸ› Elsevier Science 🌐 English βš– 478 KB

A dc magnetron system for cathode sputtering with a spool-shaped cathode is described. In comparison with the cylindrical cathode, the spool-shaped cathode increases the intensity of the discharge by one order of magnitude for gas pressures of 10 -2 to IO -3 torr. The main characteristics of the sys