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Redeposition of backscattered material in a dc magnetron sputtering system

โœ Scribed by NS Rizk; A Rizk; SK Habib


Publisher
Elsevier Science
Year
1990
Tongue
English
Weight
429 KB
Volume
40
Category
Article
ISSN
0042-207X

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โœ J. Schulte; G. Sobe; G. Reiss ๐Ÿ“‚ Article ๐Ÿ“… 1997 ๐Ÿ› John Wiley and Sons ๐ŸŒ English โš– 902 KB

For a balanced dc magnetron discharge a linear model for the formation of excited and ionized species is presented. The consideration is based on collisional kinetic theory and a correlation of discharge current with ionization rates, and leads to normalized rate coefficients. The electron energy di