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dc magnetron system for cathode sputtering

✍ Scribed by KI Kirov; NA Ivanov; ED Atanasova; GM Minchev

Publisher: Elsevier Science
Year: 1976
Tongue: English
Weight: 478 KB
Volume: 26
Category: Article
ISSN: 0042-207X
DOI: 10.1016/s0042-207x(76)80483-6

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✦ Synopsis

A dc magnetron system for cathode sputtering with a spool-shaped cathode is described. In comparison with the cylindrical cathode, the spool-shaped cathode increases the intensity of the discharge by one order of magnitude for gas pressures of 10 -2 to IO -3 torr. The main characteristics of the system are described.

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