𝔖 Bobbio Scriptorium

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1124. Properties of silicon nitride thin films prepared by cathodic sputtering: V N Gashtold et al, elektron tekh materials, 5, 1970, 63–67 (in Russian).

Publisher: Elsevier Science
Year: 1971
Tongue: English
Weight: 130 KB
Volume: 21
Category: Article
ISSN: 0042-207X
DOI: 10.1016/0042-207x(71)92285-8

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