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1532.Silicon nitride films prepared by the technique of plasma sputtering: Yu M Zolotaev et al, Elektron Tekh Polup Prib, 5 1970, 56–59 (in Russian)

Publisher: Elsevier Science
Year: 1971
Tongue: English
Weight: 138 KB
Volume: 21
Category: Article
ISSN: 0042-207X
DOI: 10.1016/0042-207x(71)90346-0

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