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X-ray photoelectron spectroscopy study of chlorine incorporation in thermally grown HCl oxides on silicon

✍ Scribed by A.S. Vengurlekar; A.N. Chandorkar; K.V. Ramanathan

Publisher
Elsevier Science
Year
1984
Tongue
English
Weight
373 KB
Volume
114
Category
Article
ISSN
0040-6090

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