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X-ray photoelectron spectroscopic analysis of HfO2/Hf/SiO2/Si structure

✍ Scribed by Ruiqin Tan; Yasushi Azuma; Isao Kojima

Publisher: Elsevier Science
Year: 2005
Tongue: English
Weight: 173 KB
Volume: 241
Category: Article
ISSN: 0169-4332
DOI: 10.1016/j.apsusc.2004.09.030

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