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X-ray imaging and diffraction study of strain relaxation in MBE grown SiGe/Si layers

✍ Scribed by Burle, N.; Escoubas, S.; Kasper, E.; Werner, J.; Oehme, M.; Lyutovich, K.

Book ID: 118766663
Publisher: John Wiley and Sons
Year: 2012
Tongue: English
Weight: 688 KB
Volume: 10
Category: Article
ISSN: 1862-6351
DOI: 10.1002/pssc.201200544

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