[Widerkehr & Associates 1996 Symposium on VLSI Technology. Digest of Technical Papers - Honolulu, HI, USA (11-13 June 1996)] 1996 Symposium on VLSI Technology. Digest of Technical Papers - 25 Å gate oxide without boron penetration for 0.25 and 0.3-μm PMOSFETs

✍ Scribed by Liu, C.T.; Ma, Y.; Cheung, K.P.; Chang, C.P.; Fritzinger, L.; Becerro, J.; Luftman, H.; Vaidya, H.M.; Colonell, J.I.; Kamgar, A.; Minor, J.F.; Murray, R.G.; Lai, W.Y.C.; Pai, C.S.; Hillenius, S.J.

• Book ID: 126717279
• Publisher: Widerkehr & Associates
• Year: 1996
• Weight: 213 KB
• Category: Article
• ISBN-13: 9780780333420
• DOI: 10.1109/VLSIT.1996.507777