[Widerkehr & Associates 1996 Symposium on VLSI Technology. Digest of Technical Papers - Honolulu, HI, USA (11-13 June 1996)] 1996 Symposium on VLSI Technology. Digest of Technical Papers - A shallow trench isolation study for 0.25/0.18 μm CMOS technologies and beyond

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✍ Yoshitomi, T.; Ohguro, T.; Saito, M.; Ono, M.; Morifuji, E.; Momose, H.S.; Iwai, 📂 Article 📅 1996 🏛 Widerkehr & Associates ⚖ 276 KB

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✍ Liu, C.T.; Ma, Y.; Cheung, K.P.; Chang, C.P.; Fritzinger, L.; Becerro, J.; Luftm 📂 Article 📅 1996 🏛 Widerkehr & Associates ⚖ 213 KB

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✍ Wann, C.H.; Tu, R.; Bin Yu, ; Chenming Hu, ; Noda, K.; Tanaka, T.; Yoshida, M.; 📂 Article 📅 1996 🏛 Widerkehr & Associates ⚖ 257 KB

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✍ Ohgaro, T.; Morifuji, E.; Saito, M.; Ono, M.; Yoshitomi, T.; Momose, H.S.; Ito, 📂 Article 📅 1996 🏛 Widerkehr & Associates ⚖ 250 KB

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✍ Yamamoto, T.; Tanabe, A.; Togo, M.; Furukawa, A.; Mogami, T. 📂 Article 📅 1996 🏛 Widerkehr & Associates ⚖ 195 KB

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✍ De, V.K.; Xinghai Tang, ; Meindl, J.D. 📂 Article 📅 1996 🏛 Widerkehr & Associates ⚖ 245 KB