[Widerkehr & Associates 1996 Symposium on VLSI Technology. Digest of Technical Papers - Honolulu, HI, USA (11-13 June 1996)] 1996 Symposium on VLSI Technology. Digest of Technical Papers - Manufacturable and reliable fluorine-doped low-k interlayer dielectric process for high performance logic LSI

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✍ Wann, C.H.; Tu, R.; Bin Yu, ; Chenming Hu, ; Noda, K.; Tanaka, T.; Yoshida, M.; 📂 Article 📅 1996 🏛 Widerkehr & Associates ⚖ 257 KB

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✍ Yoshitomi, T.; Ohguro, T.; Saito, M.; Ono, M.; Morifuji, E.; Momose, H.S.; Iwai, 📂 Article 📅 1996 🏛 Widerkehr & Associates ⚖ 276 KB

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✍ Haddad, S.; Vei-Han Chan, ; Hao Fang, ; Yuan Tang, ; Ramsbey, M.; Wang, A.; Yu S 📂 Article 📅 1996 🏛 Widerkehr & Associates ⚖ 202 KB

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✍ De, V.K.; Xinghai Tang, ; Meindl, J.D. 📂 Article 📅 1996 🏛 Widerkehr & Associates ⚖ 245 KB

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✍ Dixit, G.A.; Taylor, K.J.; Singh, A.; Lee, C.K.; Shinn, G.B.; Konecni, A.; Hsu, 📂 Article 📅 1996 🏛 Widerkehr & Associates ⚖ 202 KB

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✍ Tahui Wang, ; Tse-En Chang, ; Lu-Ping Chiang, ; Chimoon Huang, ; Guo, J.C. 📂 Article 📅 1996 🏛 Widerkehr & Associates ⚖ 215 KB