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[Widerkehr & Associates 1996 Symposium on VLSI Technology. Digest of Technical Papers - Honolulu, HI, USA (11-13 June 1996)] 1996 Symposium on VLSI Technology. Digest of Technical Papers - An integrated low resistance aluminum plug and low-k polymer dielectric for high performance 0.25 μm interconnects

✍ Scribed by Dixit, G.A.; Taylor, K.J.; Singh, A.; Lee, C.K.; Shinn, G.B.; Konecni, A.; Hsu, W.Y.; Brennan, K.; Mi-Chang Chang, ; Havemann, R.H.

Book ID: 126633965
Publisher: Widerkehr & Associates
Year: 1996
Weight: 202 KB
Category: Article
ISBN-13: 9780780333420
DOI: 10.1109/VLSIT.1996.507803

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