✦ LIBER ✦

Tungsten Etching in CF[sub 4] and SF[sub 6] Discharges

✍ Scribed by Tang, C. C.

Book ID: 118176194
Publisher: The Electrochemical Society
Year: 1984
Tongue: English
Weight: 720 KB
Volume: 131
Category: Article
ISSN: 0013-4651
DOI: 10.1149/1.2115489

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Experimental studies of cold electron at

Experimental studies of cold electron attachment to SF[sub 6], CF[sub 3]Br, and CCl[sub 2]F[sub 2]

✍ Le Garrec, J. L.; Sidko, O.; Queffelec, J. L.; Hamon, S.; Mitchell, J. B. A.; Ro 📂 Article 📅 1997 🏛 American Institute of Physics 🌐 English ⚖ 463 KB

Inductively coupled plasma etching of Si

Inductively coupled plasma etching of SiC in SF[sub 6]/O[sub 2] and etch-induced surface chemical bonding modifications

✍ Jiang, Liudi; Cheung, R.; Brown, R.; Mount, A. 📂 Article 📅 2003 🏛 American Institute of Physics 🌐 English ⚖ 393 KB

n+-Polysilicon Etching in CCl[sub 4]∕He

n+-Polysilicon Etching in CCl[sub 4]∕He Discharges: Characterization and Modeling

✍ Gogolides, Evangelos 📂 Article 📅 1989 🏛 The Electrochemical Society 🌐 English ⚖ 935 KB

Influence of rotational motion of molecu

Influence of rotational motion of molecules on the thermal conductivity of solid SF[sub 6], CHCl[sub 3], C[sub 6]H[sub 6], and CCl[sub 4]

✍ Purskii, O. I. 📂 Article 📅 2003 🏛 American Institute of Physics 🌐 English ⚖ 681 KB

Highly Selective Etching of Si[sub 3]N[s

Highly Selective Etching of Si[sub 3]N[sub 4] to SiO[sub 2] Employing Fluorine and Chlorine Atoms Generated by Microwave Discharge

✍ Suto, S. 📂 Article 📅 1989 🏛 The Electrochemical Society 🌐 English ⚖ 395 KB

Synthesis of K[sub 2]SiF[sub 6]:Mn[sup 4

Synthesis of K[sub 2]SiF[sub 6]:Mn[sup 4+] Red Phosphor from Silica Glasses by Wet Chemical Etching in HF/KMnO[sub 4] Solution

✍ Takahashi, Toru; Adachi, Sadao 📂 Article 📅 2009 🏛 The Electrochemical Society 🌐 English ⚖ 502 KB