Inductively coupled plasma etching of SiC in SF[sub 6]/O[sub 2] and etch-induced surface chemical bonding modifications

✍ Scribed by Jiang, Liudi; Cheung, R.; Brown, R.; Mount, A.

• Book ID: 120349221
• Publisher: American Institute of Physics
• Year: 2003
• Tongue: English
• Weight: 393 KB
• Volume: 93
• Category: Article
• ISSN: 0021-8979
• DOI: 10.1063/1.1534908