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Tribological behavior of RF sputtering WS2 thin films with vacuum annealing

โœ Scribed by Du Guangyu; Ba Dechun; Tan Zhen; Liu Kun

Book ID
113846556
Publisher
Elsevier
Year
2011
Tongue
English
Weight
409 KB
Volume
18
Category
Article
ISSN
1875-3892

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TiO 2 thin films were deposited on unheated and heated glass substrates at an elevated sputtering pressure of 3 Pa by radio frequency (RF) reactive magnetron sputtering. TiO 2 films deposited at room temperature were annealed in air for 1 h at various temperatures ranging from 300 to 600 ยฐC. The str