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Transport Parameters in the n-Type Moderately Doped Region of Silicon Devices at 300 K

โœ Scribed by H. Van Cong; S. Charar; S. Brunet; J. C. Martin


Publisher
John Wiley and Sons
Year
1983
Tongue
English
Weight
193 KB
Volume
117
Category
Article
ISSN
0370-1972

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