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Effective electric field in the n-type moderately doped region of silicon devices at 300 K

โœ Scribed by H. Van Cong; S. Brunet; S. Charar; S. Benet; C. Delseny; J. C. Martin


Publisher
John Wiley and Sons
Year
1983
Tongue
English
Weight
148 KB
Volume
117
Category
Article
ISSN
0370-1972

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