The effect of oxygen remote plasma treat
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Lee, Seungjun ;Bang, Seokhwan ;Park, Joohyun ;Park, Soyeon ;Jeong, Wooho ;Jeon,
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Article
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2010
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John Wiley and Sons
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English
β 358 KB
## Abstract We deposited ZnO thin films by atomic layer deposition (ALD) and then investigated the chemical and electrical characteristics after plasma treatment. The chemical bonding states were examined by Xβray photoelectron spectroscopy (XPS). The XPS spectra of O 1s showed that the intensity o