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Transient enhanced diffusion in arsenic-implanted short time annealed silicon

โœ Scribed by Kalish, R.; Sedgwick, T. O.; Mader, S.; Shatas, S.


Book ID
120163077
Publisher
American Institute of Physics
Year
1984
Tongue
English
Weight
470 KB
Volume
44
Category
Article
ISSN
0003-6951

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๐Ÿ“œ SIMILAR VOLUMES


Transient enhanced diffusion of arsenic
โœ Solmi, S.; Ferri, M.; Bersani, M.; Giubertoni, D.; Soncini, V. ๐Ÿ“‚ Article ๐Ÿ“… 2003 ๐Ÿ› American Institute of Physics ๐ŸŒ English โš– 310 KB