TP-A1 enhancement of effective barrier height in a Ti-silicon Schottky diode using low-energy ion implantation

✍ Scribed by Li, S.S.; Kim, C.S.; Wang, K.L.

• Book ID: 114593216
• Publisher: IEEE
• Year: 1979
• Tongue: English
• Weight: 166 KB
• Volume: 26
• Category: Article
• ISSN: 0018-9383
• DOI: 10.1109/t-ed.1979.19729