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A computer-aided simulation model for the I–V characteristic of M-n-p silicon Schottky-barrier diodes produced by use of low-energy arsenic-ion implantation

✍ Scribed by Ching-Yuan Wu; Ming-Chein Chang; An-Jui Shey


Publisher
Elsevier Science
Year
1983
Tongue
English
Weight
758 KB
Volume
26
Category
Article
ISSN
0038-1101

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