Enhancement of effective barrier height in Ti-silicon Schottky diode using low-energy ion implantation

✍ Scribed by Li, S.S.; Kim, J.S.; Wang, K.L.

• Book ID: 114593465
• Publisher: IEEE
• Year: 1980
• Tongue: English
• Weight: 277 KB
• Volume: 27
• Category: Article
• ISSN: 0018-9383
• DOI: 10.1109/t-ed.1980.20031