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Three-Dimensional Simulation of Target Erosion in DC Magnetron Sputtering

โœ Scribed by Shidoji, Eiji; Nemoto, Masaharu; Nomura, Takuji; Yoshikawa, Yukio

Book ID
111688684
Publisher
Institute of Pure and Applied Physics
Year
1994
Tongue
English
Weight
663 KB
Volume
33
Category
Article
ISSN
0021-4922

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In situ thin films of YBa2Cu3O7 prepared
In situ thin films of YBa2Cu3O7 prepared by single target DC-magnetron sputtering
โœ J.-M. Triscone; M.G. Karkut; O. Brunner; L. Antognazza; M. Decroux; ร˜. Fischer ๐Ÿ“‚ Article ๐Ÿ“… 1989 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 347 KB

We have prepared in situ thin films of YBa2fu307 by single target dc reactive magnetron sputtering. By a delicate adjustment of the oxygen partial pressure as well as the total sputtering pressure, we can grow stoichiometric films using a stoichiometric target. This method gives highly reproducible