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Three-dimensional discharge simulation of inductively coupled plasma (ICP) etching reactor

✍ Scribed by YiRan An; YiJia Lu; DongSan Li; YaoSong Chen

Book ID: 107355025
Publisher: SP Science China Press
Year: 2008
Tongue: English
Weight: 348 KB
Volume: 51
Category: Article
ISSN: 1006-9321
DOI: 10.1007/s11431-008-0065-1

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