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The effect of discharge conditions of ICP etching reactor on plasma parameters

✍ Scribed by Yijia Lu; Yaosong Chen; Yiran An

Book ID: 106331971
Publisher: The Chinese Society of Theoretical and Applied Mechanics; Institute of Mechanics, Chinese Academy of Sciences
Year: 2009
Tongue: English
Weight: 762 KB
Volume: 25
Category: Article
ISSN: 0567-7718
DOI: 10.1007/s10409-009-0294-y

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