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Thin Films of ZrO2 for High-k Applications Employing Engineered Alkoxide- and Amide-Based MOCVD Precursors

✍ Scribed by R. Thomas; R. Bhakta; A. Milanov; A. Devi; P. Ehrhart

Publisher: John Wiley and Sons
Year: 2007
Tongue: English
Weight: 387 KB
Volume: 13
Category: Article
ISSN: 0948-1907
DOI: 10.1002/cvde.200606512

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