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Growth and Characterization of Ti-Ta-O Thin Films on Si Substrates by Liquid Injection MOCVD for High-k Applications from Modified Titanium and Tantalum Precursors

✍ Scribed by Anjana Devi; Malte Hellwig; Davide Barreca; Harish Parala; Reji Thomas; Hans-Werner Becker; Ram. S. Katiyar; Roland A. Fischer; Eugenio Tondello


Publisher
John Wiley and Sons
Year
2010
Tongue
English
Weight
670 KB
Volume
16
Category
Article
ISSN
0948-1907

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