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thin film studied by micro-Raman spectroscopy

✍ Scribed by Yuzyuk, Yu. I.; Katiyar, R. S.; Alyoshin, V. A.; Zakharchenko, I. N.; Markov, D. A.; Sviridov, E. V.

Book ID
124082978
Publisher
The American Physical Society
Year
2003
Tongue
English
Weight
119 KB
Volume
68
Category
Article
ISSN
1098-0121

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Structural study of TiO2 thin films by m
Structural study of TiO2 thin films by micro-Raman spectroscopy
✍ Niilisk, Ahti ;Moppel, Mart ;PΓ€rs, Martti ;Sildos, Ilmo ;Jantson, Taavi ;Avarmaa πŸ“‚ Article πŸ“… 2006 πŸ› Walter de Gruyter GmbH 🌐 English βš– 269 KB

The Raman spectroscopy method was used for structural characterization of TiO 2 thin films prepared by atomic layer deposition (ALD) and pulsed laser deposition (PLD) on fused silica and single-crystal silicon and sapphire substrates. Using ALD, anatase thin films were grown on silica and silicon su